Interface chemistry and epitaxial growth modes ofSrF2on Si(001)

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

NiSi2/Si interface chemistry and epitaxial growth mode

Epitaxial NiSi2 thin films are formed by annealing of Ni on sulfur-implanted silicon (100). The atomic structure and chemistry of the NiSi2/Si interface are investigated by aberration-corrected transmission electron microscopy. The interface is atomically sharp and runs mainly along the (100) plane. {111} segments of interface are also observed as minor facets. The atomic structure of the (100)...

متن کامل

Tuning the growth orientation of epitaxial films by interface chemistry.

The support of epitaxial films frequently determines their crystallographic orientation, which is of crucial importance for their properties. We report a novel way to alter the film orientation without changing the substrate. We show for the growth of CoO on the Ir(100) surface that, while the oxide grows in (111) orientation on the bare substrate, the orientation switches to (100) by introduci...

متن کامل

Epitaxial growth of single crystalline lattice-matched Pr0.9Y1.1O3 on SrO-passivated Si001: growth orientation and crystallization tailoring by interface engineering

In this work, SrO buffer layers were employed as an interface engineering approach to realize single crystalline mixed ternary rare earth bixbyite oxide (RE2O3) films on Si (001) substrate. Single crystalline mixed PrxY2-xO3 (x=0-2) has been successfully grown on Si (111) (Ref. 7). However, the formation of such mixed oxide can only be realized at >750 °C, therefore when it is directly grown on...

متن کامل

MOCVD growth of non-epitaxial and epitaxial ZnS thin films

Thin films of ZnS have been deposited by MOCVD on both BaTa206/ITO/glass and Si substrates. Diethylzinc (DEZn) and H2S are used for deposition on substrates heated to the 250-400°C temperature range. The microstructure and properties of ZnS films were studied by X-ray diffractometry (XRD), ultraviolet/visible spectrophotometry (UVS) and scanning electron microscopy (SEM). Films prepared on BaTa...

متن کامل

GROWTH OF EPITAXIAL BaTiO

Metalorganic chemical vapor deposition (MOCVD) was used to deposit epitaxial BaTiO 3 thin films on (100) MgO substrates at 600'C. The metalorganic precursors employed in the deposition experiments were hydrated Ba(thd)2 (thd = CIIH190 2) and titanium isopropoxide. The films were analyzed by means of transmittance spectroscopy, wavelength dispersive x-ray spectrometry, secondary ion mass spectro...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Physical Review B

سال: 2007

ISSN: 1098-0121,1550-235X

DOI: 10.1103/physrevb.75.075403